SAKURA, Tanaka; HIROSHI, Nakamura. Lithography Simulation Acceleration through Gradient Boosting Machines. Optimizations in Applied Machine Learning, [S. l.], v. 3, n. 1, 2023. Disponível em: https://ojs.mri-pub.com/index.php/OAML/article/view/37. Acesso em: 4 feb. 2026.